Microscope Zeiss Orion NanoFab

Description

Seamlessly switch between neon and helium beams with ORION NanoFab:

• Use the neon beam to machine nanostructures at great speed and achieve high throughput
• Use the helium beam to create delicate sub-10 nm structures
• Generate high resolution images with depth of field 5 to 10 times greater than FE-SEMs and a resolution down to 0.5 nm

Manufacturer and model

Carl Zeiss Microscopy - Orion NanoFab

Technical specifications

• Fast machining of sub-10 nm structures
• Gas injection system (GIS) allows deposition of conducting (Pt) and isolating (TEOS) materials as well as silicon etching (XeF2)
• High resolution imaging (0.5 nm)
• Sample travel:
  • X: 50 mm motorised
  • Y: 50 mm motorised
  • Z: 8 mm motorised
  • Rotation: 360° motorised (compucentric)
  • Tilt: -5° à 54° motorised (eucentric)

Examples of available processes

• Observation of isolating materials, thanks to the flood gun that allows to overcome the problem of the specimen becoming positively charged