Photoplotter
Description
Direct write lithography for fast prototyping
Manufacturer and model
Heidelberg Instruments - DWL66fs
Technical specifications
- Source: Laser diode emitting at 405 nm
- Maximum substrate diameter: 150mm
- Active writing area: 140mm x 140mm
- Placement accuracy: 50nm
- Low resolution head: critical dimensions up to 2.5µm
- High resolution head: critical dimensions up to 0.6µm
- Compatible with CIF, GDSii, DXF and Gerber formats
Examples of available processes
- Direct write in photoresists AZ 1500, AZ nLof, SU-8 TF 6000, including two layers for lift-off processes