Plasma Etcher Oxford Cobra III-V

Description 

III-V compounds and heterostructures etching

Manufacturer and model

Oxford Instruments - Plasma Pro 100-D Cobra 300

Technical specifications 

• Electrode temperature : --150°C to 400°C
• ICP Source : Up 3kW at 2MHz
• Plate source : Up to 600W at 13,56MHz
• Gas installed on the system : Ar, O2, N2, H2, SF6, SiCl4, BCl2, CH4, HBr
• Sample size : up to 200mm
• Optical spectrometer (end point) : no

Examples of available processes

• Etching of III-V, Ge, GaN materials
• Atomic Layer Etching (ALE)